設備名稱 Equipment Name

管式A&P設備  Horizontal PEALD (A&P)

設備型號 Equipment Model

PD-520L/PD-520MAX

設備用途 Equipment Application

AlO+SiN薄膜沉積。
AlO+SiN Thin-film Deposition.

技術特點  Features

1、原子層沉積工藝特性，成膜均勻性好。

Atomic layer deposition process, with better film uniformity.

2、同機臺或同管完成多層膜沉積，減少工藝環(huán)節(jié)，有效提升良率、降低碎片率。
Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

3、自主研發(fā)液態(tài)源前驅體蒸氣輸送與前驅體快速切換技術。
Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

4、適應不同前驅體、不同材料鈍化層沉積，工藝拓展空間大。
Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.

設備參數(shù)  Parameters